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Nanyang Technological University

Probing C₈₄-embedded Si Substrate Using Scanning Probe Microscopy and Molecular Dynamics

11.7K Views

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13:58 min

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September 28th, 2016

DOI :

10.3791/54235-v

September 28th, 2016

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Mon-Shu Ho¹, Chih-Pong Huang², Jyun-Hwei Tsai³, Che-Fu Chou¹, Wen-Jay Lee³

¹Department of Physics and Institute of Nanoscience, National Chung Hsing University, ²Metallurgy Section, Materials & Electro-Optics Research Division, National Chung-Shan Institute of Science and Technology, ³National Center for High-Performance Computing

Summary

This paper reports the nanomaterial fabrication of a fullerene Si substrate inspected and verified by nanomeasurements and molecular dynamic simulation.

Explore More Videos

C84 embedded Si Substrate

Scanning Probe Microscopy

Molecular Dynamics

Silicon 111 Substrate

Electronic Properties

Optoelectronic Properties

Mechanical Properties

Magnetic Properties

Field Emission Properties

Chapters in this video

0:05

Title

1:21

Fabrication of Hexagonal-closed-packaged (HCP) Overlayer of C₈₄ in Si Substrate

2:57

Measurements of Electronic Properties of C₈₄-embedded Si Substrate

5:07

Measurements of Surface Magnetism

6:17

Measurements of Nanomechanical Properties by AFM

6:49

Measurement of Nanomechanical Properties by Molecular Dynamics Simulation

11:05

Results: Characterization of C₈₄-embedded Silicon Substrate by Nanomeasurements and Molecular Dynamic Simulation

12:46

Conclusion

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