7.7K Views
•
09:59 min
•
June 23rd, 2018
DOI :
June 23rd, 2018
•0:05
Title
0:26
Si Doping and Isolation
2:12
Sacrificial Oxide Layer Deposition
2:59
Deposition of the First Layer of Polyimide and Performing the First Metallization
4:43
Deposition of the Second Layer of Polyimide and Performing the Second Metallization
5:12
Encapsulating the Sample with Polyimide and Opening via Holes and Mesh Structure
5:56
Etching the Sacrificial Layer and Transferring the Sample to a Flexible Substrate
7:39
Results: Current-Voltage Characteristics for the Phototransistor Array in the Curved State
8:45
Conclusion
Video correlati
33.4K Views
9.1K Views
8.0K Views
10.0K Views
8.2K Views
13.1K Views
11.7K Views
4.0K Views
8.2K Views
8.9K Views