这种材料是基于由明尼苏达双城大学的创业基金支持的工作。这项工作的部分以表征基金，明尼苏达州，通过MRSEC程序的NSF资助的材料研究设施网络（www.mrfn.org）的成员大学进行。这项工作的一部分也在其中通过NNCI程序从美国国家科学基金会获得部分支持明尼苏达纳米中心进行。

注意:几个在这些合成中使用的化学物质是有毒的，高度易燃，和触摸或吸入时可能引起刺激和严重的器官损伤。操作时，请佩戴适当的个人防护装备（PPE）。 1.金（Au）的纳米柱阵列的第一层（图2a-c和图2e-G）的制备<ol><li> 对Au电镀铜（Cu）籽晶层的制备（图2a，b和图2e中，f） <ol><li>使用4"高电阻率硅（Si）晶片。（电阻率:560 - 840Ω·cm）的作为基板的硅晶片是N型掺杂和抛光在一侧（ 图2a，电子 ）。 </li><li>切Si晶片成2厘米×2.5厘米的片，供以后使用。 </li><li>使用电子束（E-束）蒸发过程作为Si和铜之间的粘合层中的Si的样品沉积为5nm铬（Cr）层。 </li><li>上使用的现有的Cr层的顶部沉积10nm的Cu层电子束蒸发过程作为对Au电镀的种子层（ 图2b中，f）。 </li></ol></li><li> 电镀金纳米柱阵列（图2c，G） <ol><li> 构图纳米柱阵列 <ol><li>旋上2000转1.1节准备的60秒样本大衣光刻胶。 </li><li>烤样品在热板上在115℃下进行60秒。 </li><li>暴露与包含数千纳米柱图案为22号的Cr光掩模下的紫外线（UV）光致抗蚀剂-light（功率〜15毫瓦/厘米2）。 </li><li>与90秒搅拌开发商开发。 </li><li>冲洗用去离子（DI）水的样品并吹干用气枪样品。 </li></ol></li><li> 电镀金纳米柱阵列 <ol><li>在样品上，用丙酮去除光致抗蚀剂的顶部部分，以暴露用于电极连接的Cu籽晶层。 </li><li>连接SAMPLE（Cu籽晶层），使用的夹具和一个金属丝源计的负端。在这种情况下，所述样品是在电镀过程中的阳极。 </li><li>一块铂的连接（Pt）的涂覆的硅（大小相同样品）到源米的正端。铂是在电镀过程中的阴极。 </li><li>淹没都在金电镀液中Pt阴极和铜阳极。保持彼此面对的约1厘米的距离的两个电极。 </li><li>打开源表并在样品8分钟供应1.12五电镀Au的恒定电压（沉积速率:〜100纳米/分钟）。 </li><li>冲洗用DI水样品，随后用丙酮去除光致抗蚀剂。 </li><li>再次用去离子水清洗样品和吹干用气枪。 </li><li>检查在显微镜下电镀金纳米柱阵列。 </li><li>测量在Au纳米柱的厚度与轮廓（的厚度金奈米柱是〜800纳米）。 注:恒流的建立也可以用于电镀金纳米支柱。在这两个恒定电压和恒定电流的调校，用于金电镀提供了理想的电流和电压可以通过试验和错误来达到。 </li></ol></li></ol></li></ol> 2.创建金奈米柱之间的纳米间隙（图2d，H） <ol><li> Cr和Cu层的除去 <ol><li>浸没在铜蚀刻剂的样品，直到铜颜色消失。 </li><li>用去离子水清洗样品和吹干用气枪。 </li><li>检查在显微镜下坳奈米柱。 </li><li>淹没在Cr掩膜蚀刻剂样品10秒。 </li><li>用去离子水清洗样品和吹干用气枪。 </li><li>检查在显微镜下坳奈米柱。 </li></ol></li><li> 纳米级氧化铝的制备（ 的 Al 2 O 3）的差距 <ol><li>热火ALD系统湛BER至200℃。 </li><li>将样品在腔室的中心。 </li><li>腔室抽真空至真空并设置循环数为100（沉积速率:〜1埃/循环）。 </li><li>顺序和交替地脉冲三甲基铝（TMA）气体与0.015秒和水（H 2 O）蒸气与0.015秒的时间周期的时间周期到室中均匀地沉积在样品上的 Al 2 O 3层。每个脉冲之间的时间间隔为5秒。 TMA脉冲期间腔室压力是10乇和H 2 O蒸气脉冲期间的压力为2乇。 </li><li>清除和真空沉积的每个周期之间的腔。存款的 Al 2 O 3为100次循环，并采取了从腔室的样品。 </li><li>测量使用椭的的ALD 的 Al 2 O 3的厚度。 </li></ol></li></ol> 3.一种Au薄膜的第二层的制备（图2I-L和图2M-p）的<ol><li> 对Au电镀铜种子层的制备（图2I，米） <ol><li>将样品在电子束蒸发器样品架的中心。 </li><li>关闭在电子束蒸发器中的样品的旋转。 </li><li>在样品上沉积5nm的Cr层充当的 Al 2 O 3和Cu之间的粘合层。使用电子束蒸发过程中无样本轮换。 </li><li>沉积在使用电子束蒸发工艺没有样品旋转作为对Au电镀的籽晶层的现有的Cr层的顶部10纳米的Cu。 </li></ol></li><li> 电镀金薄膜（图2J，N） <ol><li>样品（Cu籽晶层）连接到使用一夹具和一导线的源计的负端子。在这种情况下，所述样品是在电镀过程中的阳极。 </li><li>铂阴极连接到源米的正端。 </li><li>淹没两个Pt阴极和Cu ANODE在金电镀液。保持彼此面对的约1厘米的距离的两个电极。 </li><li>打开源表并设置为1.35的恒定电压和在样本16分钟电镀Au等。 </li><li>用去离子水清洗样品和吹干用气枪。 </li><li>检查电镀Au及在显微镜下的预先电镀的Au纳米柱阵列。 </li><li>测量凹纳米柱的厚度与轮廓（在Au纳米柱的厚度为400〜纳米）。 注:向在Au电镀在节1.2.2类似的，恒流的建立也可用于电镀Au薄膜。在这两个恒定电压和恒定电流的调校，用于金电镀提供了理想的电流和电压可以通过试验和错误来达到。 </li></ol></li><li> 铬和铜层（图2K，O）的去除 <ol><li>淹没在铜蚀刻液样品10秒。 </li><li>用去离子水样本ð吹塑干燥用空气枪。 </li><li>检查在显微镜下坳奈米柱。 </li><li>淹没在Cr掩膜蚀刻剂样品10秒。 </li><li>用去离子水清洗样品和吹干用气枪。 </li><li>检查在显微镜下坳奈米柱。 注:另外，再次淹没在金电镀液样品去除铬和铜（步骤3.3）之后第二电镀Au层上淀积金额外的一层。这种额外的Au层增加了第二Au层的总厚度，并确保在Au层和Al 2 O 3层（ 图2I，p）的之间的良好接触。 </li></ol></li></ol> 4. C形SRR的定义（图2Q-S和图2U-W） <ol><li> 构图C形SRR（图2季度，U） <ol><li>旋涂层样品上的光致抗蚀剂以2000rpm进行60秒。 </li><li>在烤115℃热板样品60秒。 </li><l我&gt;暴露在UV光致抗蚀剂用光罩铬为22秒（的〜15毫瓦/ 平方厘米的功率）。 </li><li>与90秒搅拌开发商开发。 </li><li>用去离子水清洗样品和吹干用气枪样本。 </li></ol></li><li> 使用离子磨（图2R，V和图2S，w）的C形定义 <ol><li>附加上用双面铜导电带的离子磨样品架的样本。 </li><li>降温离子磨室6℃。 </li><li>离子磨为300伏的束电压和125毫安为〜30分钟的电子束电流的取样。 </li><li>取出样本，检查C形外的金奈米柱。 </li><li>重复步骤4.2.3和4.2.4如果金仍是C形外部可见。 </li><li>超声处理样品中的丙酮去除光致抗蚀剂。 </li><li>用去离子水清洗样品和吹干用气枪。 </li><li>检查在显微镜下的样品。 </li><li>重复步骤4.2.6和4.2。7，如果光致抗蚀剂没有完全去除。 注意:可替换地，适用于氧抗蚀软化步骤，将光致抗蚀剂去除光刻胶之前。然而，超声浴是，如果适用，除去光致抗蚀剂的最有效的方法。 </li></ol></li></ol> 5.罢免的 Al 2 O 3的空气纳米间隙（图2T，X） <ol><li>浸没在5％氟化氢（HF）溶液的样品进行5分钟，以除去的 Al 2 O 3。 </li><li>用去离子水清洗样品和吹干用气枪。 </li></ol>

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作者什么都没有透露。

这种制造技术具有用于通过现有的方法，如电子束光刻和自组装产生纳米尺度结构显著优点。首先，纳米尺度的结构可以通过使用光掩模，具有纳米柱的阵列，这是不实际的用电子束光刻工艺的大面积（整个晶片）来实现。第二，在制造过程中使用传统的晶片规模微加工过程，这是更快，更简单，更便宜相比电子束光刻。第三，在原子尺度的纳米间隙可以容易地通过ALD工艺具有精确控制的特征尺寸创建。 铬和铜电子束蒸发无样本轮换直接允许铬和铜沉积在用最小的侧壁沉积基材。这是由于以下的Au电镀工艺至关重要，因为金只能被连接到源计Cu籽晶层上电镀。由于Cu层S于在Au纳米柱的顶端与基片上的Cu层断开，金不能在衬底上电镀。质量和电镀金厚度取决于电镀电压/电流及电镀时间。较高的电压/电流导致高沉积速率。然而，高电压/电流也能导致低质量的Au沉积。电镀金低质量低的电导率比标准的Au材料以及许多在Au中，从而降低了位移电流循环的SRR的强度空隙，从而导致弱的谐振行为和谐振峰的幅度较低。因此，一个合适的电压/电流是必要的，以实现高品质的Au纳米支柱。电镀时间和电压/电流应精确地也被控制，以确保该Au薄膜（Au构成的第二层）的厚度小于在Au纳米柱（Au构成的第1层）的。 2 O 3层。的通过ALD沉积的 Al 2 O 3的沉积速度和质量取决于该腔室内部的反应温度。在200℃以上的反应温度，推荐实现高品质的 Al 2 O 3薄膜。循环次数和温度可以被精确地控制，以获得的 Al 2 O 3层具有所需厚度。纳米间隙（ 图3H）的大小是用于实现基于纳米柱-SRR的高Q因子的关键。纳米间隙尺寸的增大增加了纳米间隙内的能量存储，这导致高的Q因子。然而纳米间隙的大小不能无限制地增加。当纳米间隙大小超过约50nm，金纳米柱之间的位移电流急剧下降而无法穿过所述n肛门隙，导致谐振响应的消失。此外，如果在Al 2 O 3纳米间隙的大小小于2纳米，对Au沉积可击穿电介质阻挡（ 的 Al 2 O 3纳米间隙）电镀电压，导致金纳米柱之间的传导在Au电镀液，这导致电镀在Au纳米柱的顶部上的第二Au层（第一金层）。此限制导致难以实现超薄的 Al 2 O 3的差距不破金纳米柱之间的绝缘屏障。 采用有限元法（FEM）来模拟的SRR（ 图3i和3K）。在透射光谱三个谐振峰被称为第一（1 ST）模式，第二（2 ND）模式，和对SRR的第三（3 次 ）模式。基于纳米柱-SRR的透射光谱与10纳米的Al <sub使用太赫兹时域光谱（ 图3J和3升 ）进行测定&gt; 2 O 3的差距和10nm的空气间隙。所有测得的透射光谱相匹配的模拟数据，证明所制造的基于纳米柱-的SRR满足预期设计。 连续的金属薄膜和电介质纳米尺度的间隙的组合提供了更多的能量存储结构相对于传统的基于胶片的谐振环，这导致约450（超过45倍以上的Q因子更高的超高Q因子传统的基于薄膜的SRR）和大频率偏移（约比基于薄膜SRR的频移）放大17倍。在此视频杂志中所示的独特制造技术允许数千纳米柱成形SRR的在大面积上制作。由于Au纳米支柱的形成在很大程度上增加了SRR的表面区域和纳米尺度的间隙的赌注的数量吐温的Au纳米支柱增强了能量的存储量（电荷），可以实现超高Q因数导致较高的灵敏度。此外，施加到基于纳米柱-的SRR中的物质都内的纳米间隙向纳米间隙的介电常数的变化，导致在基于纳米柱-的SRR，这导致了高选择性的大的频率变化。因此，基于纳米柱，使用的SRR电镀金，编造ALD技术是理想的高度急性化学和生物分子传感单元。

太赫兹超材料（MMS）已经开发了用于生物医学传感器和频率捷装置1，2，3，4，5，6，7，8，9，10，11。为了提高太赫兹的MM传感器的灵敏度和频率选择性，基于纳米柱分割环谐振器（SRR）已经使用金（Au）的内部产生位移电流纳米柱阵列以激发具有超高品质因子的THz共振（设计Q因数）（〜450）（ 图1）12。尽管基于纳米柱-的SRR表现出高Q值和有前途的传感能力，例如nanostructur制造具有高纵横比（大于40）和纳米尺度的间隙（子10毫微米）在大面积上ES仍然具有挑战性13。 最常用的技术来制造纳米级结构是电子束光刻（EBL）14，15，16，17。然而，EBL的分辨率仍然有限，由于光斑尺寸，电子散射，抗蚀性能，以及开发过程18，19。此外，它是不实际的制造使用EBL在大面积上的纳米结构，由于一个缓慢的过程的时间和大量处理费用20。以实现纳米结构的另一种策略是使用自组装技术21,22。通过在溶液中和util的自组装金属纳米立方体（NCS）定义静电作用和NC之间的聚合物配体的协会，组织良好的一维数组NC具有纳米级的差距可以达到23。纳米间隙的大小取决于纳米晶之间的聚合物配位体，并且可以通过具有不同分子量的24，25，26施加不同的聚合物材料来控制。自组装是实现可扩展性和成本效益的纳米结构23的强大技术。然而，相对于传统的微和纳米制造工艺的制造工艺比较复杂，和纳米间隙尺寸的控制不是用于电子设备的应用程序足够精确。为了成功地制造基于纳米柱-的SRR，一种新的制造方法应该被发明，实现以下目标:i）本制造工艺很容易申请，并与约定兼容人微纳米制造工艺; ⅱ）制造在大面积上是适用的; ⅲ）纳米间隙尺寸可以用0.1纳米的分辨率可容易且精确地控制，并且可以按比例缩小至10nm或更小。 一种新的制造方法是使用电镀工艺的组合和原子层沉积（ALD）工艺来制造基于纳米柱-的SRR证明。因为电镀是低成本的自填充过程中，它很容易制造的结构在大面积上。 ALD是一种可以通过在反应循环的过程中精确地控制的化学气相沉积（CVD）工艺。 ALD薄膜的分辨率可以是0.1纳米，该薄膜被均匀地涂覆有高的质量，这是合适的，以创建纳米尺度的间隙27，28。与10纳米间隙或更少，基于纳米柱-SRR阵列可以成功地制作在6毫米×6毫米的区域。既有Simulated和测量的太赫兹透射光谱显示出具有超高Q值和大频移，这证明通过位移电流介导的基于纳米柱，SRR的可行性共振行为。详细的制造方法是在协议部分如下所述，与视频协议可帮助从业者了解的制造过程，并避免与基于纳米柱-SRR的制造相关联的常见错误。

<table border="0" cellpadding="0" cellspacing="0" width="1240">
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			<td height="21" style="height:21px;width:311px;">Silicon Wafer</td>
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			<td style="width:437px;">100mm diameter, N-type, one-side polish, resitivity: 560-840 &#937;&#8226;cm</td>
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			<td style="width:295px;">Fisher Chemical</td>
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			<td style="width:295px;">Technic Inc.</td>
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			<td>2612 System SourceMeter</td>
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			<td>Powersonic series</td>
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			<td height="21" style="height:21px;width:311px;">Hydrofluoric Acid</td>
			<td style="width:295px;">Sigma-Aldrich</td>
			<td style="width:199px;">244279</td>
			<td>Diluted to 5%</td>
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fabrication of nanopillar-based split ring resonators for displacement current mediated resonances in terahertz metamaterials

太赫兹裂环谐振器（SRR）超材料（MMS）已经研究了气体，化学和生物分子传感应用，因为SRR不受环境特性，如温度和压力围绕所述谐振器。在太赫兹频率的电磁辐射是生物相容的，这是一个重要的条件特别是对生物分子传感应用。然而，品质因子（Q因子）和传统薄膜基于开口环谐振器的频率响应（SRR）的MM是非常低的，这限制了它们的敏感性和选择性的传感器。在这项工作中，新的基于纳米柱-SRR彩信，利用位移电流，旨在提高Q因子高达450，它是围绕比传统的基于薄膜的MM的高出45倍。除了增强的Q因子，所述基于纳米柱-MMS诱导更大的频率偏移（相比于通过传统获得的移位17次人薄膜基于MMS）。因为显著增强Q因数和频率偏移以及生物相容的辐射的特性，该太赫兹基于纳米柱-SRR是具有高灵敏度和选择性的生物分子的传感器的发展理想的MM而不引起损坏或变形的生物材料。一种新的制造工艺已被证明是建立位移电流导太赫兹彩信基于纳米柱-的SRR。两步金（Au）的电镀处理和原子层沉积（ALD）工艺用于创建的Au纳米支柱之间的子10纳米尺度的间隙。由于ALD工艺是一个共形涂覆工艺，均匀的氧化铝（ 的 Al 2 O 3）的纳米级厚度层可以实现。通过顺序电镀另一个Au薄膜以填充的 Al 2 O 3和Au，密堆积的Au- 的 Al 2 O 3 -Au结构具有纳米级之间的空间中的 Al 2 O 3的差距可以是制造。纳米间隙的尺寸可以通过精确控制ALD工艺，其具有0.1纳米的准确度的沉积循环来明确界定。

<html>制造方案显示每个步骤（ 图2a-x）的 。光学图像（ 图2Y-AC）和扫描电子显微镜（SEM）图像（ 图2AD-AG），收集在不同制造步骤的基于纳米柱-的SRR。动画（ 图2a-c）示出电镀的Au纳米柱的第一层和电镀的Au膜的第二层以及它们之间产生的纳米间隙。 图2d示出了基于纳米柱-SRR的与两个的 Al 2 O 3纳米间隙和空气纳米间隙截面方案。收集SEM图像对Au纳米柱之间的基于纳米柱-SRR阵列和纳米尺度的间隙（ 图2AF，2AG，3E-H）。与Al 2 O 3纳米的差距和空气的纳米间隙样品的两个模拟和测量透射光谱图（ 图3I-1）。 <html> jove_content"FO: - together.within页保留="1"&gt; <img alt="图1" src="/files/ftp_upload/55289/55289fig1.jpg" /> 图1:通过位移电流介导的基于纳米柱，SRR的说明。 （A，B）的位移电流（I D）引起的两块金属板和两个纳米柱由电动电场E之间。成千上万的Au纳米柱的定义的基于纳米柱，SRR的（C）示意图（H:奈米柱，A的高度:面对区; D:纳米间隙的大小; L:奈米柱的宽度和ε:介电常数在纳米间隙） 。 （ 四 ）为基础的薄膜SRR和基于纳米柱-SRR的Q因子。的约450的Q因子可与10nm的纳米间隙尺寸基于纳米柱-SRR来实现。下图是适应与先进光学材料12的许可。ig1large.jpg"目标="_空白"&gt;点击此处查看该图的放大版本。 <img alt="图2" src="/files/ftp_upload/55289/55289fig2.jpg" /> 图2:基于纳米柱，SRR的制作方案。基于纳米柱-SRR的制造工艺的- （ 叔 ）3D动画和横截面示意图。 （Y - AC）在不同的制造步骤基于纳米柱，SRR的光学图像。 （ 广告 - AG）在不同的制造步骤基于纳米柱-的SRR以及一个5纳米的 Al 2 O 3的间隙（AG）的SEM图像。下图是适应与先进光学材料12的许可。 <a href="https://ecsource-jove-com.remotexs.ntu.edu.sg/files/ftp_upload/55289/55289fig2large.jpg" target="_blank">请点击此处查看该图的放大版本。</a> 图3:基于纳米柱，SRR的刻画。 （ 一 - 四 ）基于纳米柱，SRR的制作方案。 （E - 高 ）基于纳米柱，SRR的SEM图像。 （I） 的 Al 2 O 3纳米间隙基于纳米柱，SRR的模拟透射光谱。 （J） 的 Al 2 O 3纳米间隙基于纳米柱，SRR的实测透射光谱。 （k）的空气纳米间隙基于纳米柱，SRR的模拟透射光谱。 （L）测量空气纳米间隙基于纳米柱-SRR的透射光谱。下图是适应与先进光学材料12的许可。 <a href="https://ecsource-jove-com.remotexs.ntu.edu.sg/files/ftp_upload/55289/55289fig3large.jpg" target="_blank">请点击此处查看该图的放大版本。&lt;</a>/ A&gt;

Watch this Scientific Journal Video about Fabrication of Nanopillar-Based Split Ring Resonators for Displacement Current Mediated Resonances in Terahertz Metamaterials at JoVE.com

Fabrication of Nanopillar-Based Split Ring Resonators for Displacement Current Mediated Resonances in Terahertz Metamaterials

一个设计和一个新的基于纳米柱，开口环谐振器（SRR）的制造协议提出。

基于纳米柱裂环谐振器的研制为位移电流共振介导太赫兹超材料

Terahertz (THz) split ring resonator (SRR) metamaterials (MMs) has been studied for gas, chemical, and biomolecular sensing applications because the SRR ...

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Electromagnetic Induction

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7.7K 次观看.  University of Minnesota. 一个设计和一个新的基于纳米柱，开口环谐振器（SRR）的制造协议提出。 

视频: Fabrication of Nanopillar-Based Split Ring Resonators for Displacement Current Mediated Resonances in Terahertz Metamaterials

Fabricating Metamaterials Using the Fiber Drawing Method

Metamaterials are man-made composite materials, fabricated by assembling components much smaller than the wavelength at which they operate 1. They owe their electromagnetic properties to the structure of their constituents, instead of the atoms that compose them. For example, sub-wavelength metal wires can be arranged to possess an effective electric permittivity that is either positive or negative at a given frequency, in contrast to the metals themselves 2. This unprecedented control over the behaviour of light can potentially lead to a number of novel devices, such as invisibility cloaks 3, negative refractive index materials 4, and lenses that resolve objects below the diffraction limit 5. However, metamaterials operating at optical, mid-infrared and terahertz frequencies are conventionally made using nano- and micro-fabrication techniques that are expensive and produce samples that are at most a few centimetres in size 6-7. Here we present a fabrication method to produce hundreds of meters of metal wire metamaterials in fiber form, which exhibit a terahertz plasmonic response 8. We combine the stack-and-draw technique used to produce microstructured polymer optical fiber 9 with the Taylor-wire process 10, using indium wires inside polymethylmethacrylate (PMMA) tubes. PMMA is chosen because it is an easy to handle, drawable dielectric with suitable optical properties in the terahertz region; indium because it has a melting temperature of 156.6 &deg;C which is appropriate for codrawing with PMMA. We include an indium wire of 1 mm diameter and 99.99% purity in a PMMA tube with 1 mm inner diameter (ID) and 12 mm outside diameter (OD) which is sealed at one end. The tube is evacuated and drawn down to an outer diameter of 1.2 mm. The resulting fiber is then cut into smaller pieces, and stacked into a larger PMMA tube. This stack is sealed at one end and fed into a furnace while being rapidly drawn, reducing the diameter of the structure by a factor of 10, and increasing the length by a factor of 100. Such fibers possess features on the micro- and nano- scale, are inherently flexible, mass-producible, and can be woven to exhibit electromagnetic properties that are not found in nature. They represent a promising platform for a number of novel devices from terahertz to optical frequencies, such as invisible fibers, woven negative refractive index cloths, and super-resolving lenses.

Metamaterials at terahertz frequencies offer unique opportunities, but are challenging to fabricate in bulk. We adapt the fabrication procedure for microstructured polymer optical fibers to inexpensively fabricate metamaterials potentially on an industrial scale. We produce polymethylmethacrylate fibers containing ~10 &mu;m diameter indium wires separated by ~100 &mu;m, which exhibit a terahertz plasmonic response.

制造超材料使用光纤拉丝法

Metamaterials are man-made composite materials, fabricated by assembling components much smaller than the wavelength at which they operate 1. They owe ...

科研

工程学

Terahertz Microfluidic Sensing Using a Parallel-plate Waveguide Sensor

Refractive index (RI) sensing is a powerful noninvasive and label-free sensing technique for the identification, detection and monitoring of microfluidic samples with a wide range of possible sensor designs such as interferometers and resonators 1,2. Most of the existing RI sensing applications focus on biological materials in aqueous solutions in visible and IR frequencies, such as DNA hybridization and genome sequencing. At terahertz frequencies, applications include quality control, monitoring of industrial processes and sensing and detection applications involving nonpolar materials.
Several potential designs for refractive index sensors in the terahertz regime exist, including photonic crystal waveguides 3, asymmetric split-ring resonators 4, and photonic band gap structures integrated into parallel-plate waveguides 5. Many of these designs are based on optical resonators such as rings or cavities. The resonant frequencies of these structures are dependent on the refractive index of the material in or around the resonator. By monitoring the shifts in resonant frequency the refractive index of a sample can be accurately measured and this in turn can be used to identify a material, monitor contamination or dilution, etc.
The sensor design we use here is based on a simple parallel-plate waveguide 6,7. A rectangular groove machined into one face acts as a resonant cavity (Figures 1 and 2). When terahertz radiation is coupled into the waveguide and propagates in the lowest-order transverse-electric (TE1) mode, the result is a single strong resonant feature with a tunable resonant frequency that is dependent on the geometry of the groove 6,8. This groove can be filled with nonpolar liquid microfluidic samples which cause a shift in the observed resonant frequency that depends on the amount of liquid in the groove and its refractive index 9.
Our technique has an advantage over other terahertz techniques in its simplicity, both in fabrication and implementation, since the procedure can be accomplished with standard laboratory equipment without the need for a clean room or any special fabrication or experimental techniques. It can also be easily expanded to multichannel operation by the incorporation of multiple grooves 10. In this video we will describe our complete experimental procedure, from the design of the sensor to the data analysis and determination of the sample refractive index.

The procedure for implementing a refractive index sensor for terahertz frequencies based on a grooved parallel-plate waveguide geometry is described here. The method yields a measurement of the refractive index of a small volume of liquid through monitoring of the shift in the resonant frequency of the waveguide structure

太赫兹微流控测量中的一个平行板波导传感器

Refractive index (RI) sensing is a powerful noninvasive and label-free sensing technique for the identification, detection and monitoring of microfluidic ...

Design, Fabrication, and Experimental Characterization of Plasmonic Photoconductive Terahertz Emitters

In this video article we present a detailed demonstration of a highly efficient method for generating terahertz waves. Our technique is based on photoconduction, which has been one of the most commonly used techniques for terahertz generation 1-8. Terahertz generation in a photoconductive emitter is achieved by pumping an ultrafast photoconductor with a pulsed or heterodyned laser illumination. The induced photocurrent, which follows the envelope of the pump laser, is routed to a terahertz radiating antenna connected to the photoconductor contact electrodes to generate terahertz radiation. Although the quantum efficiency of a photoconductive emitter can theoretically reach 100%, the relatively long transport path lengths of photo-generated carriers to the contact electrodes of conventional photoconductors have severely limited their quantum efficiency. Additionally, the carrier screening effect and thermal breakdown strictly limit the maximum output power of conventional photoconductive terahertz sources. To address the quantum efficiency limitations of conventional photoconductive terahertz emitters, we have developed a new photoconductive emitter concept which incorporates a plasmonic contact electrode configuration to offer high quantum-efficiency and ultrafast operation simultaneously. By using nano-scale plasmonic contact electrodes, we significantly reduce the average photo-generated carrier transport path to photoconductor contact electrodes compared to conventional photoconductors 9. Our method also allows increasing photoconductor active area without a considerable increase in the capacitive loading to the antenna, boosting the maximum terahertz radiation power by preventing the carrier screening effect and thermal breakdown at high optical pump powers. By incorporating plasmonic contact electrodes, we demonstrate enhancing the optical-to-terahertz power conversion efficiency of a conventional photoconductive terahertz emitter by a factor of 50 10.

We describe methods for the design, fabrication, and experimental characterization of plasmonic photoconductive emitters, which offer two orders of magnitude higher terahertz power levels compared to conventional photoconductive emitters.

电浆光电导太赫兹发射器的设计，制造和实验表征

In this video article we present a detailed demonstration of a highly efficient method for generating terahertz waves. Our technique is based on ...

Evaluating Plasmonic Transport in Current-carrying Silver Nanowires

Plasmonics is an emerging technology capable of simultaneously transporting a plasmonic signal and an electronic signal on the same information support1,2,3. In this context, metal nanowires are especially desirable for realizing dense routing networks4. A prerequisite to operate such shared nanowire-based platform relies on our ability to electrically contact individual metal nanowires and efficiently excite surface plasmon polaritons5 in this information support. In this article, we describe a protocol to bring electrical terminals to chemically-synthesized silver nanowires6 randomly distributed on a glass substrate7. The positions of the nanowire ends with respect to predefined landmarks are precisely located using standard optical transmission microscopy before encapsulation in an electron-sensitive resist. Trenches representing the electrode layout are subsequently designed by electron-beam lithography. Metal electrodes are then fabricated by thermally evaporating a Cr/Au layer followed by a chemical lift-off. The contacted silver nanowires are finally transferred to a leakage radiation microscope for surface plasmon excitation and characterization8,9. Surface plasmons are launched in the nanowires by focusing a near infrared laser beam on a diffraction-limited spot overlapping one nanowire extremity5,9. For sufficiently large nanowires, the surface plasmon mode leaks into the glass substrate9,10. This leakage radiation is readily detected, imaged, and analyzed in the different conjugate planes in leakage radiation microscopy9,11. The electrical terminals do not affect the plasmon propagation. However, a current-induced morphological deterioration of the nanowire drastically degrades the flow of surface plasmons. The combination of surface plasmon leakage radiation microscopy with a simultaneous analysis of the nanowire electrical transport characteristics reveals the intrinsic limitations of such plasmonic circuitry.

Silver nanowires can simultaneously transport electrons and optical information in the form of surface plasmons. A procedure is described here to realize such a shared circuitry and the limitations at propagating both information carriers are evaluated.

Plasmonics is an emerging technology capable of simultaneously transporting a plasmonic signal and an electronic signal on the same information ...

Fabrication and Characterization of Superconducting Resonators

Superconducting microwave resonators are of interest for a wide range of applications, including for their use as microwave kinetic inductance detectors (MKIDs) for the detection of faint astrophysical signatures, as well as for quantum computing applications and materials characterization. In this paper, procedures are presented for the fabrication and characterization of thin-film superconducting microwave resonators. The fabrication methodology allows for the realization of superconducting transmission-line resonators with features on both sides of an atomically smooth single-crystal silicon dielectric. This work describes the procedure for the installation of resonator devices into a cryogenic microwave testbed and for cool-down below the superconducting transition temperature. The set-up of the cryogenic microwave testbed allows one to do careful measurements of the complex microwave transmission of these resonator devices, enabling the extraction of the properties of the superconducting lines and dielectric substrate (e.g., internal quality factors, loss and kinetic inductance fractions), which are important for device design and performance.

Superconducting microwave resonators are of interest for detection of light, quantum computing applications and materials characterization. This work presents a detailed procedure for fabrication and characterization of superconducting microwave resonator scattering parameters.

制备与表征超导谐振器的

Superconducting microwave resonators are of interest for a wide range of applications, including for their use as microwave kinetic inductance detectors ...

Colloidal Synthesis of Nanopatch Antennas for Applications in Plasmonics and Nanophotonics

We present a method for colloidal synthesis of silver nanocubes and the use of these in combination with a smooth gold film, to fabricate plasmonic nanoscale patch antennas. This includes a detailed procedure for the fabrication of thin films with a well-controlled thickness over macroscopic areas using layer-by-layer deposition of polyelectrolyte polymers, namely poly(allylamine) hydrochloride (PAH) and polystyrene sulfonate (PSS). These polyelectrolyte spacer layers serve as a dielectric gap in between silver nanocubes and a gold film. By controlling the size of the nanocubes or the gap thickness, the plasmon resonance can be tuned from about 500 nm to 700 nm. Next, we demonstrate how to incorporate organic sulfo-cyanine5 carboxylic acid (Cy5) dye molecules into the dielectric polymer gap region of the nanopatch antennas. Finally, we show greatly enhanced fluorescence of the Cy5 dyes by spectrally matching the plasmon resonance with the excitation energy and the Cy5 absorption peak. The method presented here enables the fabrication of plasmonic nanopatch antennas with well-controlled dimensions utilizing colloidal synthesis and a layer-by-layer dip-coating process with the potential for low cost and large-scale production. These nanopatch antennas hold great promise for practical applications, for example in sensing, ultrafast optoelectronic devices and for high-efficiency photodetectors.

A protocol for the colloidal synthesis of silver nanocubes and fabrication of plasmonic nanoscale patch antennas with sub-10 nm gaps is presented.

在等离子体激元和纳米光子学应用Nanopatch天线的合成胶体

We present a method for colloidal synthesis of silver nanocubes and the use of these in combination with a smooth gold film, to fabricate plasmonic ...

Stimulated Stokes and Antistokes Raman Scattering in Microspherical Whispering Gallery Mode Resonators

Dielectric microspheres can confine light and sound for a length of time through high quality factor whispering gallery modes (WGM). Glass microspheres can be thought as a store of energy with a huge variety of applications: compact laser sources, highly sensitive biochemical sensors and nonlinear phenomena. A protocol for the fabrication of both the microspheres and coupling system is given. The couplers described here are tapered fibers. Efficient generation of nonlinear phenomena related to third order optical non-linear susceptibility &#935;(3) interactions in triply resonant silica microspheres is presented in this paper. The interactions here reported are: Stimulated Raman Scattering (SRS), and four wave mixing processes comprising Stimulated Anti-stokes Raman Scattering (SARS). A proof of the cavity-enhanced phenomenon is given by the lack of correlation among the pump, signal and idler: a resonant mode has to exist in order to obtain the pair of signal and idler. In the case of hyperparametric oscillations (four wave mixing and stimulated anti-stokes Raman scattering), the modes must fulfill the energy and momentum conservation and, last but not least, have a good spatial overlap.

Efficient generation of nonlinear phenomena related to third order optical non-linear susceptibility &#935;(3) interactions in triply resonant silica microspheres is presented in this paper. The interactions here reported are: Stimulated Raman Scattering (SRS), and four wave mixing processes comprising Stimulated Anti-stokes Raman Scattering (SARS).

刺激斯托克斯和反斯托克斯拉曼散射在微球形回音壁模式谐振器

Dielectric microspheres can confine light and sound for a length of time through high quality factor whispering gallery modes (WGM). Glass microspheres ...

Measurement of Quantum Interference in a Silicon Ring Resonator Photon Source

Silicon photonic chips have the potential to realize complex integrated quantum information processing circuits, including photon sources, qubit manipulation, and integrated single-photon detectors. Here, we present the key aspects of preparing and testing a silicon photonic quantum chip with an integrated photon source and two-photon interferometer. The most important aspect of an integrated quantum circuit is minimizing loss so that all of the generated photons are detected with the highest possible fidelity. Here, we describe how to perform low-loss edge coupling by using an ultra-high numerical aperture fiber to closely match the mode of the silicon waveguides. By using an optimized fusion splicing recipe, the UHNA fiber is seamlessly interfaced with a standard single-mode fiber. This low-loss coupling allows the measurement of high-fidelity photon production in an integrated silicon ring resonator and the subsequent two-photon interference of the produced photons in a closely integrated Mach-Zehnder interferometer. This paper describes the essential procedures for the preparation and characterization of high-performance and scalable silicon quantum photonic circuits.

Silicon photonic chips have the potential to realize complex integrated quantum systems. Presented here is a method for preparing and testing a silicon photonic chip for quantum measurements.

量子干涉效应在硅谐振环光子源测量

Silicon photonic chips have the potential to realize complex integrated quantum information processing circuits, including photon sources, qubit ...

Fabrication of Polymer Microspheres for Optical Resonator and Laser Applications

This paper describes three methods of preparing fluorescent microspheres comprising &#960;-conjugated or non-conjugated polymers: vapor diffusion, interface precipitation, and mini-emulsion. In all methods, well-defined, micrometer-sized spheres are obtained from a self-assembling process in solution. The vapor diffusion method can result in spheres with the highest sphericity and surface smoothness, yet the types of the polymers able to form these spheres are limited. On the other hand, in the mini-emulsion method, microspheres can be made from various types of polymers, even from highly crystalline polymers with coplanar, &#960;-conjugated backbones. The photoluminescent (PL) properties from single isolated microspheres are unusual: the PL is confined inside the spheres, propagates at the circumference of the spheres via the total internal reflection at the polymer/air interface, and self-interferes to show sharp and periodic resonant PL lines. These resonating modes are so-called "whispering gallery modes" (WGMs). This work demonstrates how to measure WGM PL from single isolated spheres using the micro-photoluminescence (&#181;-PL) technique. In this technique, a focused laser beam irradiates a single microsphere, and the luminescence is detected by a spectrometer. A micromanipulation technique is then used to connect the microspheres one by one and to demonstrate the intersphere PL propagation and color conversion from coupled microspheres upon excitation at the perimeter of one sphere and detection of PL from the other microsphere. These techniques, &#181;-PL and micromanipulation, are useful for experiments on micro-optic application using polymer materials.

Protocols for the synthesis of microspheres from polymers, the manipulation of microspheres, and micro-photoluminescence measurements are presented.

用于光学谐振器和激光应用的聚合物微球的制造

This paper describes three methods of preparing fluorescent microspheres comprising &#960;-conjugated or non-conjugated polymers: vapor diffusion, ...

Fabrication of Ultra-thin Color Films with Highly Absorbing Media Using Oblique Angle Deposition

Ultra-thin film structures have been studied extensively for use as optical coatings, but performance and fabrication challenges remain.&#160; We present an advanced method for fabricating ultra-thin color films with improved characteristics. The proposed process addresses several fabrication issues, including large area processing. Specifically, the protocol describes a process for fabricating ultra-thin color films using an electron beam evaporator for oblique angle deposition of germanium (Ge) and gold (Au) on silicon (Si) substrates.&#160; Film porosity produced by the oblique angle deposition induces color changes in the ultra-thin film. The degree of color change depends on factors such as deposition angle and film thickness. Fabricated samples of the ultra-thin color films showed improved color tunability and color purity. In addition, the measured reflectance of the fabricated samples was converted into chromatic values and analyzed in terms of color. Our ultra-thin film fabricating method is expected to be used for various ultra-thin film applications such as flexible color electrodes, thin film solar cells, and optical filters. Also, the process developed here for analyzing the color of the fabricated samples is broadly useful for studying various color structures.

We present a detailed method for fabricating ultra-thin color films with improved characteristics for optical coatings. The oblique angle deposition technique using an electron beam evaporator allows improved color tunability and purity. Fabricated films of Ge and Au on Si substrates were analyzed by reflectance measurements and color information conversion.

用斜角沉积法制备高吸收介质的超薄彩色薄膜

Ultra-thin film structures have been studied extensively for use as optical coatings, but performance and fabrication challenges remain.&#160; We present ...