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Use of Sacrificial Nanoparticles to Remove the Effects of Shot-noise in Contact Holes Fabricated by E-beam Lithography

7.2K Views

07:47 min

February 12th, 2017

DOI :

10.3791/54551-v

February 12th, 2017


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Sacrificial Nanoparticles

Hoofdstukken in deze video

0:05

Title

1:20

Derivatization and Characterization of Silicon Wafer Surfaces

2:14

Gold Nanoparticle (GNP) Deposition into E-beam-patterned Holes

3:46

Pol(methyl methacrylate) (PMMA) Photoresist Reflow and Dry- and Wet-etching

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Results: Reduction of Shot-noise by Deposition and Subsequent Etching of Sacrificial GNPs

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Conclusion

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