Name: formation of thick dense yttrium iron garnet films using aerosol deposition
Uploaded: 2015-05-15T15:00:00.000+00:00
Duration: 10 min 52 s
Description: Watch this Scientific Journal Video about Formation of Thick Dense Yttrium Iron Garnet Films Using Aerosol Deposition at JoVE.com

SDJ衷心感谢对工程教育/ NRL博士后奖学金计划，与康拉德Bussmann保险丝（NRL）和武明中（美国科罗拉多州立大学）对材料的磁特性的讨论，罗恩霍尔姆（NRL）美国协会为他的部分支持设计和实施夺标AD系统。

1.粉体的制备<ol><li>作为筛接收的钇铁石榴石（YIG）粉末，得到100-150克团块的尺寸小于53微米。 </li><li>将筛分的粉末放入炉内干燥至少24小时，在温度高于300℃。 </li></ol> 2.基板制备<ol><li>清洁的衬底所需尺寸的， 例如 3 x 3毫米，用丙酮，然后异丙醇。干燥使用氮气。 </li></ol> 3.执行气溶胶沉积<ol><li>装入样品至翻译安装阶段。 <ol><li>放置双面铜带到安装阶段。将洗净的衬底上的铜带。 </li><li>测量从上述载放台的边缘的距离与样品的各边缘。记录在历史样本的板尺寸和样品位置。 </li><li>检查载物台对准平行于平移摩托的主体R的测量从上述载放台的边缘的距离，以在电机本体的使用卡尺的边缘。加载样品到沉积室。 </li><li>夹紧凸缘以密封的沉积室中。附上3 15针D-sub控制电缆的翻译电机。 </li></ol></li><li>加载粉和关闭了气溶胶室。 <ol><li>从炉中取出干燥的粉末，并将其放置在气溶胶腔室底部。滑动滤波器去堵塞棒附着到过滤器去堵塞棒。 </li><li>放置该气溶胶腔室的主体到气雾室底部。允许为主体被附接到所述底部部分中的过滤器去堵塞竿安装到搁置在搅动板。 </li><li>钳主体，以底部。附上该气溶胶室压力计到侧端口上的气溶胶腔室的主体。 </li><li>夹紧喷嘴入口部到顶部端口上的主体Òf用一个夹子QF气溶胶室。提高喷嘴进口管上的沉积室中的进气口并固定在顶部和底部接头。 </li><li>记录在历史样本的纸粉和气溶胶室身份证号码。 </li></ol></li><li>打开低真空泵用它从系统的其余部分隔离。打开淀积室照明灯。上打开旁通管线的收缩阀，开始对整个系统的抽空。 </li><li>安装压力监控软件与沉积运行标识。 </li><li>通过在命令行终端窗口中键入"pitrans"运行阶段控制器宏创建者和输入所需的信息。在创建运行日志电子表格中的新的工作表并记录沉积参数和设置说明。 </li><li>当系统压力达到约150-200毫米汞柱，稍微打开阀门unconstricted。保持约1托/ sec的抽空速率。第一次低于100毫米汞柱Ë压力开始下降的压力监控软件和翻译阶段电机控制器软件。 </li><li>一旦系统压力达到约1乇关闭所有三个阀的旁通管路和打开主泵送阀。紧固夹具上的沉积室的顶盖。 </li><li>打开鼓风机泵。打开超高纯（UHP）的氮气气缸。监控压力并记录该系统的基础压力（它典型地达到15-25毫托）。 </li><li>设置在喷嘴和基片之间的距离。使用载物台控制软件的图形用户界面窗口移动安装基板上的喷嘴。降低基板，直至其接触喷嘴。移动衬底7.5毫米在该位置上的垂直方向。 </li><li>关闭主泵送管路和监视系统上的压力监控软件的泄漏率。注意在关闭阀门的最初泄漏率。如果这LEA施钾量小于3.33毫托/秒继续，否则首先检查是否有泄漏。一个典型的泄漏速率小于1.2毫乇/秒。 </li><li>设置在沉积室蝶阀到500乇预置值。质量流量控制器值设置为13.63升/分钟（不要打开它）。 </li><li>移动的安装阶段，以用于沉积的开始位置。加载在步骤3.7到控制器软件创建的宏。 </li><li>程序函数发生器扫线之间每135和145赫兹10秒。打开函数发生器。打开氮气流。 3秒倒计时开始后，舞台控制器宏。 </li><li>监视沉积并根据需要调整气体流速来保持压力差，在500±0.5乇（或根据需要的运行）的沉积的持续时间。 注意:在淀积室中的压力通常为0.65乇，在淀积室中的压力通常为501乇。不可控制的变化在压力通常表明，超高压氮已经不多了。在压力略有下降（1-2托）在运行期间是典型的。这可通过增加气体流量来补救。在最初通过一个可见膜应形成在基板上，缺乏成膜表明该粉末和/或显著过滤器堵塞的不足雾化。 </li><li>在沉积结束时注意确切沉积运行时间。关闭氮气，函数发生器和泵。完全开放的沉积室蝶阀。 </li><li>打开位于所述沉积腔室侧的旁通阀。打开房子氮气气体调节到零，并将其重定向到淀积室中。关闭主阀抽水一边慢慢增加了温室气体调节器压力。 </li><li>家喷嘴至X = 25毫米，Y = 25mm时，和Z = 25毫米，然后关闭阶段控制器软件。 </li><li>一旦在系统中的压力已上升高于100毫米汞柱停止压力监控软件。记录用和时间来完成沉积的总的氮气。房子气压作必要的调整，直到系统达到的气氛。 </li><li>拔下3 15针D-sub阶段控制电缆和松开顶盖。除去从沉积室顶盖和卸载样品。 </li></ol> 4.沉积后检验<ol><li>从安装阶段取出样品，并检查它在显微镜下。如果有必要，清洗样品在异丙醇除去散粉。完成电影计划中的刻画。 </li></ol>

<ol>
	<li>Akedo, J. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Room+Temperature+Impact+Consolidation+(RTIC)+of+Fine+Ceramic+Powder+by+Aerosol+Deposition+Method+and+Applications+to+Microdevices.">Room Temperature Impact Consolidation (RTIC) of Fine Ceramic Powder by Aerosol Deposition Method and Applications to Microdevices.</a> J. of Therm. Spray tech. 17, 181 (2008).</li><li>Hahn, B. D., Park, D. -. S., Choi, J. -. J., Ryu, J. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Osteoconductive+hydroxyapatite+coated+PEEK+for+spinal+fusion+surgery.">Osteoconductive hydroxyapatite coated PEEK for spinal fusion surgery.</a> Appl. Surf. Sci. 283, 6-11 (2013).</li><li>Johnson, S. D., et al. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Aerosol+Deposition+of+Yttrium+Iron+Garnet+for+Fabrication+of+Ferrite-Integrated+On-Chip+Inductors.">Aerosol Deposition of Yttrium Iron Garnet for Fabrication of Ferrite-Integrated On-Chip Inductors.</a> IEEE Trans. on Magnetics. 51 (05), (2015).</li><li>Johnson, S. D., Kub, F. J., Eddy, C. R. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=ZnS/Diamond+Composite+Coatings+for+Infrared+Transmission+Applications+Formed+by+the+Aerosol+Deposition+Method.">ZnS/Diamond Composite Coatings for Infrared Transmission Applications Formed by the Aerosol Deposition Method.</a> Proceedings of SPIE. 8708, 87080T-87081T (2013).</li><li>Han, G., Ryu, J., Yoon, W. -. H., Choi, J. -. J. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Effect+of+electrode+and+substrate+on+the+fatigue+behavior+of+PZT+thick.">Effect of electrode and substrate on the fatigue behavior of PZT thick.</a> Ceram. Int. 38 (1), S241-S244 (2012).</li><li>Ryu, J., Baek, C. -. W., Lee, Y. -. S., Oh, N. -. K. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Enhancement+of+Multiferroic+Properties+in+BiFeO3-Ba(Cu1/3Nb2/3)O-3.">Enhancement of Multiferroic Properties in BiFeO3-Ba(Cu1/3Nb2/3)O-3.</a> Film. J. Am. Ceram. Soc. 94 (2), 355-358 (2011).</li><li>Park, C. -. S., Ryu, J., Choi, J. -. J., Park, D. -. S. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Giant+Magnetoelectric+Coefficient+in+3-2+Nanocomposite+Thick+Films.">Giant Magnetoelectric Coefficient in 3-2 Nanocomposite Thick Films.</a> Jpn. J. Appl. Phys. 48 (8), 1 (2009).</li><li>Ryu, J., Park, D. -. S., Schmidt, R. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=In-plane+impedance+spectroscopy+in+aerosol+deposited+NiMn2O4+negative.">In-plane impedance spectroscopy in aerosol deposited NiMn2O4 negative.</a> J. Appl. Phys. 109 (11), 112722 (2011).</li><li>Yoon, W. -. H., Ryu, J., Choi, J. -. J., Hahn, B. -. D. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Enhanced+Thermoelectric+Properties+of+Textured+Ca3Co4O9+Thick+Film+by+Aerosol+Deposition.">Enhanced Thermoelectric Properties of Textured Ca3Co4O9 Thick Film by Aerosol Deposition.</a> J. Am. Ceram. Soc. 93 (8), 2125-2127 (2010).</li><li>Ryu, J., Kim, K. -. Y., Choi, J. -. J., Hahn, B. -. D. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Flexible+Dielectric+Bi1.5Zn1.0Nb1.5O7+Thin+Films+on+a+Cu-Polyimide+Foil.">Flexible Dielectric Bi1.5Zn1.0Nb1.5O7 Thin Films on a Cu-Polyimide Foil.</a> J. Am. Ceram. Soc. 92 (2), 524-527 (2009).</li><li>Hahn, B. -. D., Lee, J. -. M., Park, D. -. S., Choi, J. -. J. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Mechanical+and+in+vitro+biological+performances+of+hydroxyapatite-carbon.">Mechanical and in vitro biological performances of hydroxyapatite-carbon.</a> Acta Biomater. 8 (8), 3205-3214 (2009).</li><li>Choi, J. -. J., Cho, K. -. S., Choi, J. -. H., Ryu, J. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Effects+of+annealing+temperature+on+solid+oxide+fuel+cells+containing+(La,Sr)+(Ga,Mg,Co)O3-&#948;+electrolyte+prepared+by+aerosol+deposition.">Effects of annealing temperature on solid oxide fuel cells containing (La,Sr) (Ga,Mg,Co)O3-&#948; electrolyte prepared by aerosol deposition.</a> Mater. Lett. 70, 44-47 (2012).</li><li>Ryu, J., Hahn, B. -. D. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Porous+Photocatalytic+TiO2+Thin+Films+by+Aerosol+Deposition.">Porous Photocatalytic TiO2 Thin Films by Aerosol Deposition.</a> J. Am. Ceram. Soc. 93 (1), 55-58 (2010).</li><li>Harris, V. G., et al. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Recent+advances+in+processing+and+applications+of+microwave+ferrites.">Recent advances in processing and applications of microwave ferrites.</a> J. of Magn. and Magn. Mat. 321, 2035 (2009).</li><li>Kang, Y. -. M., Ulyanov, A. N., Yoo, S. -. I. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=FMR+linewidths+of+YIG+films+fabricated+by+ex+situ+post-annealing+of+amorphous+films+deposited+by+rf+magnetron+sputtering.">FMR linewidths of YIG films fabricated by ex situ post-annealing of amorphous films deposited by rf magnetron sputtering.</a> Phys. Stat. Sol. (a). 204 (3), 763-767 (2007).</li><li>Popova, E., et al. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Perpendicular+magnetic+anisotropy+in+ultrathin+yttrium+iron+garnet+films+prepared+by+pulsed+laser+deposition+technique).">Perpendicular magnetic anisotropy in ultrathin yttrium iron garnet films prepared by pulsed laser deposition technique).</a> J. of Vac. Sci. Techn. A. 19 (5), 2567-2570 (2001).</li><li>Sun, Y., et al. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Growth+and+ferromagnetic+resonance+properties+of+nanometer-thick+yttrium.">Growth and ferromagnetic resonance properties of nanometer-thick yttrium.</a> Appl. Phys. Lett. 101 (15), 082405 (2012).</li><li>Kalarickal, S. S., Krivosik, P., Das, J., Kim, K. S., Patton, C. E. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Microwave+damping+in+polycrystalline+Fe-Ti-N+films:+Physical+mechanisms+and+correlations+with+composition+and+structure.">Microwave damping in polycrystalline Fe-Ti-N films: Physical mechanisms and correlations with composition and structure.</a> Phys. Rev. B. 77, 054427 (2008).</li><li>Johnson, S. D. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Advances+in+Ferrite-Integrated+On-Chip+Inductors+Using+Aerosol+Deposition.">Advances in Ferrite-Integrated On-Chip Inductors Using Aerosol Deposition.</a> Magnetics Business &amp; Technology Magazine. 10, (2014).</li><li>Johnson, S. D., Glaser, E. R., Cheng, S. -. F., Kub, F., Eddy Jr, ., R, C. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Characterization+of+As-Deposited+and+Sintered+Yttrium+Iron+Garnet+Thick+Films+Formed+by+Aerosol.">Characterization of As-Deposited and Sintered Yttrium Iron Garnet Thick Films Formed by Aerosol.</a> Appl. Phys. Express. 7, 035501 (2014).</li><li>Lee, D. -. W., Nam, S. -. M. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Factors+Affecting+Surface+Roughness+of+Al2O3+Films+Deposited+on+Cu+Substrates+by+an+Aerosol+Deposition+Method.">Factors Affecting Surface Roughness of Al2O3 Films Deposited on Cu Substrates by an Aerosol Deposition Method.</a> J. of Ceramic Proc. Research. 11, 100 (2010).</li><li>Glass, H. L., Elliott, M. T. <a target="_blank" href="http://www.ncbi.nlm.nih.gov/entrez/query.fcgi?db=PubMed&cmd=Search&doptcmdl=Citation&defaultField=Title+Word&term=Attainment+of+the+Intrinsic+FMR+Linewidth+in+Yttrium+Iron+Garnet+Films+Grown+by+Liquid+Phase+Epitaxy.J.">Attainment of the Intrinsic FMR Linewidth in Yttrium Iron Garnet Films Grown by Liquid Phase Epitaxy.J.</a> Cryst. Growth. 34, 285 (1976).</li></ol>

作者什么都没有透露。

图4中的SEM图像表明，显著骨折和致密化在沉积过程正在发生。图像被拍摄的电影，其示出了少数的空隙和晶粒的顶面的。可观察区域是最后的材料的待沉积，因此不从随后粒子的进一步的影响和致密化过程中受益， 如图1所示通过冲击从粒子2和3的样品的体积内的膜密度可以由截面图像在图5中，该图像中可以看出，随着横截面的高倍放大的插图，提供了进一步的证据，为致密的膜。 看出，在SEM图像的粗糙度也被在配置文件扫描证实定量。这些膜的粗糙度，可能是由于高速率沉积的（1.95微米/分钟）。这是可能的膜形成更慢慢将使颗粒充分断裂并粘附附加颗粒到达之前，但增加的膜粗糙度也可以是从根本上相关的增加膜厚21。在横贯薄膜厚度的下降表明，颗粒流入淀积室不是整个沉积期间保持不变。可能的原因可能源自粉末的损失中的气雾剂，粉末在气雾室的基部的聚集，和/或过滤器堵塞。充分干燥和筛分的粉末和改性的气雾室到如图3顷为改善和控制沉积速率和膜均匀性的策略。 该FMR谱此示例表明YIG薄膜具有共振场和线型这是典型的由其他技术来生长多晶YIG薄膜。在AD沉积膜的线宽比其它报道的多晶稍宽电影约100-200奥斯特16。这可能是由于在纳米晶的化妆膜。需要注意的是单晶的YIG薄膜具有小于1奥斯特的典型FMR行距甚至可比厚度22。由于这部电影是很好蓝本由洛伦兹线型人们可能会得出这样的结论膜均匀且无不均匀。在这种情况下，线宽的展宽可以归因于固有的弛豫过程，例如吉尔伯特阻尼和/或2-磁振散射18。 图6中的倾斜厚度轮廓证据表明，沉积速率是不恒定的整个过程中，因此，该膜不可能是从不均匀性完全免费的。更深入的研究需要开展全面牵连这些机制（也见讨论参考文献3），以及，更好地细化当前广告系统。非均匀覆盖的最可能的原因是该气溶胶根erated在气溶胶腔室可以被耗尽和/或过滤器被堵塞。这两种效应会引起粉末进入沉积室，以减少并由此导致较低的沉积速率的量。 上面给出的结果表明一个近11微米厚的膜在近2微米/分钟的沉积速率（对于75毫米的2区）使用AD系统和协议这里提出成功沉积。该膜由密集的压实和随机取向的晶粒，比由于参与这一过程的影响，裂缝和致密化机制的起始颗粒小得多的。影片展示了媲美FMR行距形状和共振场报道YIG薄膜15-17。需要额外的工作，以更好地控制附聚物的流动到沉积室，以确保更均匀的膜生长。 目前的工作正在进行，以进一步提高CON一致性的沉积过程。正在开发附加的干燥和筛分协议，以确保粉末具有每次运行期间相同的一致性。设计也正在进行中创造一个改进的过滤系统，用更少的堵塞。喷嘴入口的重新设计也将有助于防止结块粉末从喷嘴颈部内收集。更深入的研究的磁性和结构特性也正在进行。一些目前的研究包括，建立薄膜层 - 层，以便更好地理解各种变形在通过气溶胶沉积在这些膜的磁特性。

气溶胶沉积（AD）是可以制作的层厚度达其密度大于95％的体积为1的几百微米的厚膜沉积工艺。沉积过程被认为是发生通过冲击，断裂或变形，粘合性，颗粒的致密化一个连续的过程。 图1描述为一系列步骤，表示粒子的影响和致密化过几个步骤这一过程。如图所示，颗粒移动朝向与100-500米/秒的典型速度在衬底。作为最初的粒子撞击与基底断裂，他们坚持到基板。此锚定层提供在衬底和体膜之间的机械粘附力。随后的影响发生了下面的颗粒越来越裂缝，粘附，并进一步致密化。的连续冲击，断裂，并致密化这个过程的工作方式压缩的底层膜和粘接CRYStallites和产生的膜的密度达到大于95％的松散材料。 <img alt="图1" src="/files/ftp_upload/52843/52843fig1.jpg" /> 图1.在沉积过程。图A示出了三个粒子朝着与100-500米/秒的典型速度在衬底。面板B显示了冲击第一粒子的，骨折，和粘附的结果。面板C和D示出了第二和第三颗粒的后续影响，这进一步致密的底层膜和粘接微晶。其结果是密度大于95％的散装材料（从参考19转载许可）的电影。 <a href="https://www-jove-com.remotexs.ntu.edu.sg/files/ftp_upload/52843/52843fig1highres.jpg" target="_blank">请点击此处查看该图的放大版本。</a> AD的主要优点是，depos银行足球比赛完全发生在环境RT;从而使膜生长，例如，高的熔融温度的材料（原料粉末）上的低熔融温度的衬底。沉积速率可高达每分钟几微米和在1-20乇淀积室中的中等真空条件下进行。该过程显示扩展到非常大的沉积区，最后，它可以存保形的能力。2 有研究了AD，用于各种用途的许多材料系统，例如感应器3，耐磨涂层4，压电5，multiferroics 6，magnetoelectrics 7热敏电阻8，热电膜9，柔性电介质10中，硬组织植入物和生物陶瓷11，固体电解质12， ​​和光催化剂13。对于应用到微波器件，Severa的磁性膜需升几百微米的厚度，将理想地被直接集成到电路板的元件。一个挑战实现这一整合是需要用于制造铁氧体膜高温制度（见综述由哈里斯等人 14），例如钇铁石榴石（YIG）。出于这个原因，广告似乎是实现潜在的新进展磁集成电路技术的一个自然的选择。低成本的操作指令，高沉积速率和简单性刺激下，研究人员在德国，法国，日本，韩国的兴趣，现在在美国。 图2是绘图概述基本设置进行气溶胶沉积。压力是在位置，分别监测标记P 交流 ，P 直流和P H为气溶胶腔室，沉积腔室，和泵头。的气流，由质量流量控制器（MFC）的控制，进入气雾剂室和aerosolizes粉末。沉积室被泵来创建两个腔室之间的压力差，通过矩形（0.6毫米×4.8毫米）喷嘴开口使颗粒的流动。 <img alt="图2" src="/files/ftp_upload/52843/52843fig2.jpg" /> 图中的夺标ADM系统2.主要成分。压力处于的位置，分别标有监控P 交流 ，P DC，和P H为气溶胶室，沉积室和泵头。详见说明书。 （版权所有（2014）应用物理，从20引用转载的日本协会）。 <a href="https://www-jove-com.remotexs.ntu.edu.sg/files/ftp_upload/52843/52843fig2highres.jpg" target="_blank">请点击此处查看该图的放大版本。</a> 在这项工作中的个体的YIG颗粒的平均尺寸为0.5微米。凝聚的效果会导致这些小颗粒，以形成尺寸范围从约10微米至约400微米的大得多的聚集体。团块的尺寸和输送速率的控制是必不可少的，以实现一个密合式膜。这就需要一个气雾室，允许大小选择和均匀的粒子通量到沉积室的结构。该粉末是预筛分以除去大于53微米之前被装入气雾室的任何团块。在这项工作中所用的气溶胶室结构示于图3中 。氮气进入通过四个入口喷嘴（显示了两个在图3中）位于所述腔室的底侧。气体相互作用与YIG粉末（以绿色显示），以产生由凝聚粒子的分布的气溶胶尺寸小于53微米。在气溶胶腔室由不锈钢板连续地振动的基部的搅拌器，以保持粉末移入气流。附聚物撞击一个45微米的过滤器，只允许附聚物尺寸小于45微米，进入喷嘴入口。在进入喷嘴入口的附聚物被加速到一个大的速度和喷出到沉积室（未示出）来执行沉积。不锈钢棒的过滤器的底部连接到搅拌器（未示出）中解除堵塞的过滤器，以帮助的基极。 <img alt="图3" src="/files/ftp_upload/52843/52843fig3.jpg" /> 图3.内部气溶胶室的配置，带过滤器，入口喷嘴，并显示YIG粉末。详见说明书。 这份报告详细的实验程序，使用上述的定制系统产生的YIG的致密薄膜来执行的AD。对于在本系统中产生的11微米厚的膜代表性结果使用scannin呈现克电子显微镜（SEM），厚度轮廓和铁磁共振（FMR）。给出的结果是不打算成为磁性或薄膜材料结构的深入研究，但由于用这种技术生产的薄膜的演示。 <a href="https://www-jove-com.remotexs.ntu.edu.sg/files/ftp_upload/52843/52843fig3highres.jpg" target="_blank">请点击此处查看该图的放大版本。</a>

<table><tbody><tr><td>Ferromagnetic Resonance Spectrometer</td><td>www.bruker.com/</td><td>9.5 GHz Spectrometer</td><td></td></tr><tr><td>Scanning Electron Microscope</td><td>www.zeiss.com</td><td>LEO Supra 55</td><td></td></tr><tr><td>Profilometer</td><td>www.kla-tencor.com/</td><td>D-120</td><td></td></tr><tr><td>Stereo Microscope</td><td>www.microscopes.com</td><td>Omano Stereo Microscope</td><td>Used for inspection directly after removal from deposition chamber</td></tr><tr><td>Double-sided Copper Tape</td><td>www.2spi.com</td><td>05085A-AB</td><td>hold-down clips or other adhesives may be used</td></tr><tr><td>Nitrile Exam Gloves</td><td>www.fishersci.com</td><td>19-130-1597D</td><td></td></tr><tr><td>2-propanol</td><td>www.fishersci.com</td><td>A451SK-4</td><td></td></tr><tr><td>Acetone</td><td>www.fishersci.com</td><td>A11-1</td><td></td></tr><tr><td>Yttrium Iron Garnet Powder</td><td>www.trans-techinc.com/</td><td>Call for Product Information</td><td>Powder is custom made to order and ground to specifications</td></tr><tr><td>Stainless Steel Spoon</td><td>www.fishersci.com</td><td>14-429E</td><td>Used for scooping and transferring powder</td></tr><tr><td>Alumina Boats</td><td>www.coorstek.com/</td><td>65580</td><td></td></tr><tr><td>Drying Furnace</td><td>www.paragonweb.com</td><td>KM14 ceramic furnace</td><td>Furnace is connected to air during drying</td></tr><tr><td>Powder Sieves</td><td>www.advantechmfg.com/</td><td>270SS8F</td><td>A selection of mesh openings are needed to sieve from large down to target size</td></tr><tr><td>Ultra High Purity Nitrogen Gas</td><td>www.praxairdirect.com</td><td>NI 5.0UH-3K</td><td>Used as medium for aerosol.</td></tr><tr><td>Air Breathing Quality</td><td>www.praxairdirect.com</td><td>AI BR-4KN</td><td>Used inside furnace during drying</td></tr><tr><td>Lab Balance</td><td>www.balances.com/</td><td>Sartorius ED224S Lab Balance</td><td>Used for weighing powder</td></tr><tr><td>Sapphire Wafers</td><td>www.pmoptics.com/</td><td>PWSP-313211</td><td></td></tr></tbody></table>

formation of thick dense yttrium iron garnet films using aerosol deposition

气溶胶沉积（AD）是可以制作的层厚度达其密度大于95％的体积为几百微米的厚膜沉积工艺。 AD的主要优点是该沉积完全发生在环境温度下;由此使薄膜的生长在与不同熔融温度的材料体系。本报告描述了详细的处理步骤制备的粉末和使用该定制系统中执行的AD。代表性的表征结果显示从扫描电子显微镜，轮廓，和铁磁共振对于在本系统中生长的薄膜。作为系统的功能的代表性概述，焦点是考虑到以下所描述的协议和系统设置产生一个样本。结果表明，该系统可以成功地沉积11微米厚的钇铁石榴石薄膜在&gt; 90％的堆积密度在一个单一的5分钟沉积ř联合国。提供的方法，得到更好的控制气溶胶和粒子选择用于改善的厚度和在该膜的粗糙度变化的探讨。

在沉积完成之后，将涂覆的衬底从淀积室中取出，并使用光学立体显微镜检查。样品典型地刷，用异丙醇洗涤以除去过量的粉末，其仍然在重新加压到大气中。膜表征上这里提出使用扫描电子显微镜来评估膜的形态的代表性结果进行的，轮廓，以评估膜的厚度，均匀性，和粗糙度，以及铁磁共振来评估膜的磁特性（见参考文献20，用于在表征方法的其他详细信息）。在这项研究中，有3 x 3毫米蓝宝石基板使用上述的协议和系统设置涂覆。沉积扫描设定横跨膜成光栅0.65毫米/秒和以覆盖75 平方毫米的总面积。 图4是该膜的顶表面的SEM图像<html>示出许多小颗粒，比单个颗粒（0.5微米）的起始大小小得多。由此可见，这部电影已经形成了有些粗糙，精心压实表面很少有空隙的形象。对于这里提出了类似的结果薄膜我们已测定的密度与理论密度的-96之间90％％为YIG（5.17克/厘米3）。在图5所示的膜的剖视图也支持该膜的致密性质。 图5中的主图像显示所沉积样品的边缘沉积， 即在所形成，它不是膜的劈开截面。插图显示该膜指示膜的致密性的横截面的放大图。我们还进行了X射线衍射对所沉积薄膜和起始粉末，发现该晶体结构时不沉积变化（数据未显示;参见参考文献3和20）。 jove_content"&gt; 图6是该薄膜的台阶高度的曲线图。该样品的总面积为3毫米×3毫米（总沉积面积为75 平方毫米）。该步骤是通过除去所述膜的一部分创建沿衬底的一个边缘。红线重叠的数据通过跨越膜均三轮廓扫描指示的10.93微米的平均膜厚度。均方根粗糙度R Q = 1.37微米的沉积时间，以形成该薄膜是337秒，造成的1.95微米/分钟的沉积速率。 图7是在室温下取的FMR吸收衍生物的情节:在黑色显示的数据。甲洛伦兹衍生物线形拟合到数据显示为红色。数据的线宽为330奥斯特和谐振场是2,810奥斯特。的信号的位置和形状是比得上典型光谱多晶YIG通过其它方法， 例如 ，脉冲激光沉积或射频磁控溅射生长<html>荷兰国际集团15,16。洛伦兹线形给出了一个不错的选择，以暗示均匀的薄膜17,18的数据。 <img alt="图4" src="/files/ftp_upload/52843/52843fig4.jpg" /> 薄膜沉积后的顶表面的图4的SEM图像。该图像示出了具有许多晶粒是密集压实和比0.5微米个体起始粒径小得多的膜。 <a href="https://www-jove-com.remotexs.ntu.edu.sg/files/ftp_upload/52843/52843fig4highres.jpg" target="_blank">请按此查看这个更大版本图。</a> <img alt="图5" src="/files/ftp_upload/52843/52843fig5.jpg" /> 在蓝宝石基板上的膜的横截面的图5的SEM图像的插图是膜的横截面的放大图。ghres.jpg"目标="_空白"&gt;点击此处查看该图的放大版本。 <img alt="图6" src="/files/ftp_upload/52843/52843fig6.jpg" /> 图6.该膜的在图4和图6的代表性步骤信息表示跨越2.25毫米样品3毫米总长的厚度变化。10.93微米的平均厚度被示出为红色的线重叠的数据。 <a href="https://www-jove-com.remotexs.ntu.edu.sg/files/ftp_upload/52843/52843fig6highres.jpg" target="_blank">请点击此处查看该图的放大版本。</a> <img alt="图7" src="/files/ftp_upload/52843/52843fig7.jpg" /> 在RT拍摄该膜的图7.铁磁共振衍生物曲线的光谱是基本符合一个洛伦兹函数表示均匀均匀的膜。该linewid日为330奥斯特。 <a href="https://www-jove-com.remotexs.ntu.edu.sg/files/ftp_upload/52843/52843fig7highres.jpg" target="_blank">请点击此处查看该图的放大版本。</a>

Watch this Scientific Journal Video about Formation of Thick Dense Yttrium Iron Garnet Films Using Aerosol Deposition at JoVE.com

Formation of Thick Dense Yttrium Iron Garnet Films Using Aerosol Deposition

本报告描述了使用定制系统来在RT执行的钇铁石榴石厚膜的气溶胶沉积在蓝宝石衬底。使用扫描电子显微镜，轮廓，和铁磁谐振得到的技术的功能的代表性概述淀积膜的特征在于。

浓稠钇铁石榴石薄膜的形成使用气溶胶沉积

Aerosol deposition (AD) is a thick-film deposition process that can produce layers up to several hundred micrometers thick with densities greater than 95% ...

formation-thick-dense-yttrium-iron-garnet-films-using-aerosol

Nanyang Technological University

Research

JoVE Journal

Engineering

9.2K 次观看.  Naval Research Laboratory. 本报告描述了使用定制系统来在RT执行的钇铁石榴石厚膜的气溶胶沉积在蓝宝石衬底。使用扫描电子显微镜，轮廓，和铁磁谐振得到的技术的功能的代表性概述淀积膜的特征在于。 

视频: Formation of Thick Dense Yttrium Iron Garnet Films Using Aerosol Deposition

Fabrication of Nano-engineered Transparent Conducting Oxides by Pulsed Laser Deposition

Nanosecond Pulsed Laser Deposition (PLD) in the presence of a background gas allows the deposition of metal oxides with tunable morphology, structure, density and stoichiometry by a proper control of the plasma plume expansion dynamics. Such versatility can be exploited to produce nanostructured films from compact and dense to nanoporous characterized by a hierarchical assembly of nano-sized clusters. In particular we describe the detailed methodology to fabricate two types of Al-doped ZnO (AZO) films as transparent electrodes in photovoltaic devices: 1) at low O2 pressure, compact films with electrical conductivity and optical transparency close to the state of the art transparent conducting oxides (TCO) can be deposited at room temperature, to be compatible with thermally sensitive materials such as polymers used in organic photovoltaics (OPVs); 2) highly light scattering hierarchical structures resembling a forest of nano-trees are produced at higher pressures. Such structures show high Haze factor (&gt;80%) and may be exploited to enhance the light trapping capability. The method here described for AZO films can be applied to other metal oxides relevant for technological applications such as TiO2, Al2O3, WO3 and Ag4O4.

We describe the experimental method to deposit nanostructured oxide thin films by nanosecond Pulsed Laser Deposition (PLD) in the presence of a background gas. By using this method Al-doped ZnO (AZO) films, from compact to hierarchically structured as nano-tree forests, can be deposited.

制备纳米设计的脉冲激光沉积透明导电氧化物

Nanosecond Pulsed  Laser Deposition (PLD) in the presence of a background gas allows the deposition  of metal oxides with tunable morphology, structure, ...

科研

工程学

Atomically Defined Templates for Epitaxial Growth of Complex Oxide Thin Films

Atomically defined substrate surfaces are prerequisite for the epitaxial growth of complex oxide thin films. In this protocol, two approaches to obtain such surfaces are described. The first approach is the preparation of single terminated perovskite SrTiO3 (001) and DyScO3 (110) substrates. Wet etching was used to selectively remove one of the two possible surface terminations, while an annealing step was used to increase the smoothness of the surface. The resulting single terminated surfaces allow for the heteroepitaxial growth of perovskite oxide thin films with high crystalline quality and well-defined interfaces between substrate and film. In the second approach, seed layers for epitaxial film growth on arbitrary substrates were created by Langmuir-Blodgett (LB) deposition of nanosheets. As model system Ca2Nb3O10- nanosheets were used, prepared by delamination of their layered parent compound HCa2Nb3O10. A key advantage of creating seed layers with nanosheets is that relatively expensive and size-limited single crystalline substrates can be replaced by virtually any substrate material.

Various procedures are outlined to prepare atomically defined templates for epitaxial growth of complex oxide thin films. Chemical treatments of single crystalline SrTiO3 (001) and DyScO3 (110) substrates were performed to obtain atomically smooth, single terminated surfaces. Ca2 Nb3 O10- nanosheets were used to create atomically defined templates on arbitrary substrates.

原子定义模板复合氧化物薄膜的外延生长

Atomically defined substrate surfaces are prerequisite for the epitaxial growth of complex oxide thin films. In this protocol, two approaches to obtain ...

化学

Atomically Traceable Nanostructure Fabrication

Reducing the scale of etched nanostructures below the 10 nm range eventually will require an atomic scale understanding of the entire fabrication process being used in order to maintain exquisite control over both feature size and feature density. Here, we demonstrate a method for tracking atomically resolved and controlled structures from initial template definition through final nanostructure metrology, opening up a pathway for top-down atomic control over nanofabrication. Hydrogen depassivation lithography is the first step of the nanoscale fabrication process followed by selective atomic layer deposition of up to 2.8 nm of titania to make a nanoscale etch mask. Contrast with the background is shown, indicating different mechanisms for growth on the desired patterns and on the H passivated background. The patterns are then transferred into the bulk using reactive ion etching to form 20 nm tall nanostructures with linewidths down to ~6 nm. To illustrate the limitations of this process, arrays of holes and lines are fabricated. The various nanofabrication process steps are performed at disparate locations, so process integration is discussed. Related issues are discussed including using fiducial marks for finding nanostructures on a macroscopic sample and protecting the chemically reactive patterned Si(100)-H surface against degradation due to atmospheric exposure.

We report a protocol for combining the atomic metrology of the Scanning Tunneling Microscope for surface patterning with selective Atomic Layer Deposition and Reactive Ion Etching. Using a robust process involving numerous atmospheric exposures and transport, 3D nanostructures with atomic metrology are fabricated.

原子纳米结构可追溯制造

Reducing the scale of etched nanostructures below the 10 nm range eventually will require an atomic scale understanding of the entire fabrication process ...

Epitaxial Growth of Perovskite Strontium Titanate on Germanium via Atomic Layer Deposition

Atomic layer deposition (ALD) is a commercially utilized deposition method for electronic materials. ALD growth of thin films offers thickness control and conformality by taking advantage of self-limiting reactions between vapor-phase precursors and the growing film. Perovskite oxides present potential for next-generation electronic materials, but to-date have mostly been deposited by physical methods. This work outlines a method for depositing SrTiO3 (STO) on germanium using ALD. Germanium has higher carrier mobilities than silicon and therefore offers an alternative semiconductor material with faster device operation. This method takes advantage of the instability of germanium's native oxide by using thermal deoxidation to clean and reconstruct the Ge (001) surface to the 2&#215;1 structure. 2-nm thick, amorphous STO is then deposited by ALD. The STO film is annealed under ultra-high vacuum and crystallizes on the reconstructed Ge surface. Reflection high-energy electron diffraction (RHEED) is used during this annealing step to monitor the STO crystallization. The thin, crystalline layer of STO acts as a template for subsequent growth of STO that is crystalline as-grown, as confirmed by RHEED. In situ X-ray photoelectron spectroscopy is used to verify film stoichiometry before and after the annealing step, as well as after subsequent STO growth. This procedure provides framework for additional perovskite oxides to be deposited on semiconductors via chemical methods in addition to the integration of more sophisticated heterostructures already achievable by physical methods.

This work details the procedures for the growth and characterization of crystalline SrTiO3 directly on germanium substrates by atomic layer deposition. The procedure illustrates the ability of an all-chemical growth method to integrate oxides monolithically onto semiconductors for metal-oxide semiconductor devices.

锗通过原子层沉积钙钛矿型钛酸锶的外延生长

Atomic layer deposition (ALD) is a commercially utilized deposition method for electronic materials. ALD growth of thin films offers thickness control and ...

Electrospray Deposition of Uniform Thickness Ge23Sb7S70 and As40S60 Chalcogenide Glass Films

Solution-based electrospray film deposition, which is compatible with continuous, roll-to-roll processing, is applied to chalcogenide glasses. Two chalcogenide compositions are demonstrated: Ge23Sb7S70 and As40S60, which have both been studied extensively for planar mid-infrared (mid-IR) microphotonic devices. In this approach, uniform thickness films are fabricated through the use of computer numerical controlled (CNC) motion. Chalcogenide glass (ChG) is written over the substrate by a single nozzle along a serpentine path. Films were subjected to a series of heat treatments between 100 &#176;C and 200 &#176;C under vacuum to drive off residual solvent and densify the films. Based on transmission Fourier transform infrared (FTIR) spectroscopy and surface roughness measurements, both compositions were found to be suitable for the fabrication of planar devices operating in the mid-IR region. Residual solvent removal was found to be much quicker for the As40S60 film as compared to Ge23Sb7S70. Based on the advantages of electrospray, direct printing of a gradient refractive index (GRIN) mid-IR transparent coating is envisioned, given the difference in refractive index of the two compositions in this study.

Electrospray Deposition of Uniform Thickness Ge23Sb7S70 and As40S60 Chalcogenide Glass Films

A method of uniform thickness solution-derived chalcogenide glass film deposition is demonstrated using computer numerical controlled motion of a single-nozzle electrospray.

厚度均匀葛电沉积<sub&gt; 23</sub&gt;锑<sub&gt; 7</sub&gt;取值<sub&gt; 70</sub&gt;和As<sub&gt; 40</sub&gt;取值<sub&gt; 60</sub&gt;硫系玻璃薄膜

Solution-based electrospray film deposition, which is compatible with continuous, roll-to-roll processing, is applied to chalcogenide glasses. Two ...

Aerosol-assisted Chemical Vapor Deposition of Metal Oxide Structures: Zinc Oxide Rods

Whilst columnar zinc oxide (ZnO) structures in the form of rods or wires have been synthesized previously by different liquid- or vapor-phase routes, their high cost production and/or incompatibility with microfabrication technologies, due to the use of pre-deposited catalyst-seeds and/or high processing temperatures exceeding 900 &#176;C, represent a drawback for a widespread use of these methods. Here, however, we report the synthesis of ZnO rods via a non-catalyzed vapor-solid mechanism enabled by using an aerosol-assisted chemical vapor deposition (CVD) method at 400 &#176;C with zinc chloride (ZnCl2) as the precursor and ethanol as the carrier solvent. This method provides both single-step formation of ZnO rods and the possibility of their direct integration with various substrate types, including silicon, silicon-based micromachined platforms, quartz, or high heat resistant polymers. This potentially facilitates the use of this method at a large-scale, due to its compatibility with state-of-the-art microfabrication processes for device manufacture. This report also describes the properties of these structures (e.g., morphology, crystalline phase, optical band gap, chemical composition, electrical resistance) and validates its gas sensing functionality towards carbon monoxide.

Columnar zinc oxide structures in the form of rods are synthesized via aerosol-assisted chemical vapor deposition without the use of pre-deposited catalyst-seed particles. This method is scalable and compatible with various substrates based on either silicon, quartz or polymers.

金属氧化物结构的气溶胶辅助化学气相沉积: 氧化锌棒

Whilst columnar zinc oxide (ZnO) structures in the form of rods or wires have been synthesized previously by different liquid- or vapor-phase routes, ...

High Temperature Fabrication of Nanostructured Yttria-Stabilized-Zirconia (YSZ) Scaffolds by In Situ Carbon Templating Xerogels

We demonstrate a method for the high temperature fabrication of porous, nanostructured yttria-stabilized-zirconia (YSZ, 8 mol% yttria - 92 mol% zirconia) scaffolds with tunable specific surface areas up to 80 m2&#183;g-1. An aqueous solution of a zirconium salt, yttrium salt, and glucose is mixed with propylene oxide (PO) to form a gel. The gel is dried under ambient conditions to form a xerogel. The xerogel is pressed into pellets and then sintered in an argon atmosphere. During sintering, a YSZ ceramic phase forms and the organic components decompose, leaving behind amorphous carbon. The carbon formed in situ serves as a hard template, preserving a high surface area YSZ nanomorphology at sintering temperature. The carbon is subsequently removed by oxidation in air at low temperature, resulting in a porous, nanostructured YSZ scaffold. The concentration of the carbon template and the final scaffold surface area can be systematically tuned by varying the glucose concentration in the gel synthesis. The carbon template concentration was quantified using thermogravimetric analysis (TGA), the surface area and pore size distribution was determined by physical adsorption measurements, and the morphology was characterized using scanning electron microscopy (SEM). Phase purity and crystallite size was determined using X-ray diffraction (XRD). This fabrication approach provides a novel, flexible platform for realizing unprecedented scaffold surface areas and nanomorphologies for ceramic-based electrochemical energy conversion applications, e.g. solid oxide fuel cell (SOFC) electrodes.

High Temperature Fabrication of Nanostructured Yttria-Stabilized-Zirconia YSZ Scaffolds by In Situ Carbon Templating Xerogels

A protocol for fabricating porous, nanostructured yttria-stabilized-zirconia (YSZ) scaffolds at temperatures between 1,000 &#176;C and 1,400 &#176;C is presented.

通过纳米氧化钇稳定的二氧化锆（YSZ）的支架的高温加工<em&gt;原位</em&gt;碳模板干凝胶

We demonstrate a method for the high temperature fabrication of porous, nanostructured yttria-stabilized-zirconia (YSZ, 8 mol% yttria - 92 mol% zirconia) ...

Fabrication of Ultra-thin Color Films with Highly Absorbing Media Using Oblique Angle Deposition

Ultra-thin film structures have been studied extensively for use as optical coatings, but performance and fabrication challenges remain.&#160; We present an advanced method for fabricating ultra-thin color films with improved characteristics. The proposed process addresses several fabrication issues, including large area processing. Specifically, the protocol describes a process for fabricating ultra-thin color films using an electron beam evaporator for oblique angle deposition of germanium (Ge) and gold (Au) on silicon (Si) substrates.&#160; Film porosity produced by the oblique angle deposition induces color changes in the ultra-thin film. The degree of color change depends on factors such as deposition angle and film thickness. Fabricated samples of the ultra-thin color films showed improved color tunability and color purity. In addition, the measured reflectance of the fabricated samples was converted into chromatic values and analyzed in terms of color. Our ultra-thin film fabricating method is expected to be used for various ultra-thin film applications such as flexible color electrodes, thin film solar cells, and optical filters. Also, the process developed here for analyzing the color of the fabricated samples is broadly useful for studying various color structures.

We present a detailed method for fabricating ultra-thin color films with improved characteristics for optical coatings. The oblique angle deposition technique using an electron beam evaporator allows improved color tunability and purity. Fabricated films of Ge and Au on Si substrates were analyzed by reflectance measurements and color information conversion.

用斜角沉积法制备高吸收介质的超薄彩色薄膜

Ultra-thin film structures have been studied extensively for use as optical coatings, but performance and fabrication challenges remain.&#160; We present ...

Bulk and Thin Film Synthesis of Compositionally Variant Entropy-stabilized Oxides

Here, we present a procedure for the synthesis of bulk and thin film multicomponent (Mg0.25(1-x)CoxNi0.25(1-x)Cu0.25(1-x)Zn0.25(1-x))O (Co variant) and (Mg0.25(1-x)Co0.25(1-x)Ni0.25(1-x)CuxZn0.25(1-x))O (Cu variant) entropy-stabilized oxides. Phase pure and chemically homogeneous (Mg0.25(1-x)CoxNi0.25(1-x)Cu0.25(1-x)Zn0.25(1-x))O (x = 0.20, 0.27, 0.33) and (Mg0.25(1-x)Co0.25(1-x)Ni0.25(1-x)CuxZn0.25(1-x))O (x = 0.11, 0.27) ceramic pellets are synthesized and used in the deposition of ultra-high quality, phase pure, single crystalline thin films of the target stoichiometry. A detailed methodology for the deposition of smooth, chemically homogeneous, entropy-stabilized oxide thin films by pulsed laser deposition on (001)-oriented MgO substrates is described. The phase and crystallinity of bulk and thin film materials are confirmed using X-ray diffraction. Composition and chemical homogeneity are confirmed by X-ray photoelectron spectroscopy and energy dispersive X-ray spectroscopy. The surface topography of thin films is measured with scanning probe microscopy. The synthesis of high quality, single crystalline, entropy-stabilized oxide thin films enables the study of interface, size, strain, and disorder effects on the properties in this new class of highly disordered oxide materials.

The synthesis of high quality bulk and thin film (Mg0.25(1-x)CoxNi0.25(1-x)Cu0.25(1-x)Zn0.25(1-x))O and (Mg0.25(1-x)Co0.25(1-x)Ni0.25(1-x)CuxZn0.25(1-x))O entropy-stabilized oxides is presented.

组分变熵稳定氧化物的体积和薄膜合成

Here, we present a procedure for the synthesis of bulk and thin film multicomponent (Mg0.25(1-x)CoxNi0.25(1-x)Cu0.25(1-x)Zn0.25(1-x))O (Co variant) and ...

Radio Frequency Magnetron Sputtering of GdBa2Cu3O7&#8722;&#948;/ La0.67Sr0.33MnO3 Quasi-bilayer Films on SrTiO3 (STO) Single-crystal Substrates

Here, we demonstrate a method of coating ferromagnetic La0.67Sr0.33MnO3 (LSMO) nanoparticles on (001) SrTiO3 (STO) single-crystal substrates by radio frequency (RF) magnetron sputtering. LSMO nanoparticles were deposited with diameters from 10 to 20 nm and heights between 20 and 50 nm. At the same time, (Gd) Ba2Cu3O7&#8722;&#948; ((Gd) BCO) films were fabricated on both undecorated and LSMO nanoparticle decorated STO substrates using RF magnetron sputtering. This report also describes the properties of GdBa2Cu3O7&#8722;&#948;/ La0.67Sr0.33MnO3 quasi-bilayer films structures (e.g., crystalline phase, morphology, chemical composition); magnetization, magneto-transport, and superconducting transport properties were also evaluated.

Radio Frequency Magnetron Sputtering of GdBa2Cu3O7ÃƒÆ’Ã‚Â¢Ãƒâ€¹Ã¢â‚¬Â 'ÃƒÆ’Ã…Â½ Â´/ La0.67Sr0.33MnO3 Quasi-bilayer Films on SrTiO3 STO Single-crystal Substrates

Here, we present a protocol to grow LSMO nanoparticles and (Gd) BCO films on (001) SrTiO3 (STO) single-crystal substrates by radio frequency (RF)-sputtering.

Gdba2cu 3 o7 的射频磁控管散射-/la0.67sr 0.67 mno 3 准双层薄膜上的 srtio 3 (sto) 单晶基板上

Here, we demonstrate a method of coating ferromagnetic La0.67Sr0.33MnO3 (LSMO) nanoparticles on (001) SrTiO3 (STO) single-crystal substrates by radio ...

浓稠钇铁石榴石薄膜的形成使用气溶胶沉积

摘要

探索更多视频

此视频中的章节